ZARCHI, Meysam; SANJARI, Maryam Zare; AHANGARANI, Shahrokh. Characterization of the SiO2 film deposited by using plasma enhanced chemical vapor deposition (PECVD) with TEOS/N2/O2. Metallurgical and Materials Engineering, [S. l.], v. 19, n. 4, p. 287–294, 2013. DOI: 10.63278/10.63278/mme.v31.1. Disponível em: https://www.metall-mater-eng.com/index.php/home/article/view/175. Acesso em: 10 may. 2026.