Zarchi, M., Sanjari, M. Z. and Ahangarani, S. (2013) “Characterization of the SiO2 film deposited by using plasma enhanced chemical vapor deposition (PECVD) with TEOS/N2/O2”, Metallurgical and Materials Engineering, 19(4), pp. 287–294. doi: 10.63278/10.63278/mme.v31.1.