Zarchi, Meysam, Maryam Zare Sanjari, and Shahrokh Ahangarani. “Characterization of the SiO2 Film Deposited by Using Plasma Enhanced Chemical Vapor Deposition (PECVD) With TEOS N2 O2”. Metallurgical and Materials Engineering 19, no. 4 (December 31, 2013): 287–294. Accessed May 10, 2026. https://www.metall-mater-eng.com/index.php/home/article/view/175.